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Common Defects in UV Gel Nail Polish (9)
During the application of UV gel polish, edge lifting is an early sign of chipping. It begins at the nail’s leading or lateral edges, where small gaps or lifted margins first appear; if left unaddressed, these defects will gradually expand until the entire layer eventually flakes off. Unlike full-layer delamination, edge lifting has a distinct starting point and a predictable pattern of progression. Understanding the underlying causes of edge lifting can help you implement targeted preventive measures during use.
2026-05-05
Common Defects in UV Gel Nail Polish (Part 8)
During the application of UV gel polish, the presence of particles is one of the most common issues affecting surface smoothness. After curing, the gel polish develops tiny raised bumps on the surface, which feel noticeably rough to the touch and appear as a speckled, pitted texture. Unlike defects such as brush marks or wrinkling—which are typically caused by application technique—particle formation is more closely linked to external environmental factors and the cleanliness of the product itself.
2026-05-05
Common Defects in UV Gel Nail Polish (7)
During the application of UV gel polish, brush marks are one of the common issues that affect surface smoothness. After curing, these marks leave distinct brush-bristle impressions on the surface, resembling narrow, elongated grooves that detract from the natural, polished finish of the nail. Unlike defects such as wrinkling or bubbling, brush marks are more closely related to the ease of application and the product’s flow characteristics.
2026-05-05
Video Account
Bossin cordially invites you to visit the 2025 China International Coatings Exhibition.
UV monomer with a curing speed more than 30% faster than that of trifunctional monomers
Low-irritation version of HDDA
A high-refractive-index UV monomer
Although it’s quite ordinary, it offers great value for the price.
A UV monomer used in fields such as PCB ink, UV curing agents, and offset printing ink.
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